AdvanTech 514

Unique tri-polymer construction offers 100% comfort for optimal mechanical and chemical resistance

Critical Environments

Specific advantages

  • Extensive range adapted to all applications: wide cuff for double-gloving, extended length to protect the forearm
  • Excellent resistance and strong chemical protection against a great number of chemical products: exclusive Trionic formula made from a mix of natural latex, neoprene and nitrile
  • Manufacturing process ensuring the control of a very low level of contaminants: particulate content, non-volatile residues, extractables => Washed, controlled and packaged in an ISO 5 room / Particle rate measured compatible with the needs of an ISO 4 room
  • Silicone free to prevent traces, defects on metal sheet and glass prior to painting
  • Class 10 (ISO 4) Compatible

Standards

  • Mechanical hazards EN 388 1110X
  • Type B Specific Chemical Protection EN 374 KST
  • Micro-organisms EN 374

Product detail

Material Natural latex, polychloroprene and nitrile
Colour
Interior finish Chlorinated
Exterior finish Embossed texture
Length (cm) 38
Thickness (mm) 0.50
Size 7 8 9 10
Packaging 1 pair/bag
72 pairs/carton

Chemical chart

OVERALL CHEMICAL PROTECTION RATING

Protection rating is determined by taking into account the effects of both permeation and degradation in an attempt to provide users with an overall protection guideline when using our glove products against specific chemicals.

Meaning of the colours :

Used for high chemical exposure or chemical immersion, limited to breakthrough time based on a working day.
Used for repeated chemical contact, limited to total chemical exposure i.e. : accumulative breakthrough time based on a working day.
Splash protection only, on chemical exposure the gloves should be discarded and new gloves worn as soon as possible.
Not recommended, these gloves are deemed unsuitable for work with this chemical.
NT: Not tested
NA: "Not applicable" because not fully tested (only degradation OR permeation results)

The chemical test data and overall chemical protection rating should not be used as the absolute basis for glove selection. Actual in-use conditions may vary glove performance from the controlled conditions of laboratory tests. Factors other than chemical contact time

Chemical Product CAS # Breakthrough time
(minutes)
Permeation
level
Standard Degradation
level
Rating
1,1,1-Trichloroethane 99% 71-55-6 7 0 ASTM F739 NT
NA
1,1,1,2,2,3,4,5,5,5-Decafluoropentane 97% 138495-42-8 13 1 ASTM F739 NT
NA
1,1,2-Trichlorotrifluoroethane (Freon TF or Freon 113) 99% 76-13-1 20 1 ASTM F739 1
-
1,2 Dichloroethylene 98% 156-60-5 2 0 ASTM F739 2
-
1,3 Ethoxy propionate (Ethyl 3-ethoxypropionate) 99% 763-69-9 480 6 ASTM F739 NT
NA
2-Butoxyethanol (Butyl Cellusolve) 99% 111-76-2 53 2 ASTM F739 NT
NA
2-Butoxyethylacetate (Butyl cellosolve acetate) 85% 112-07-2 35 2 ASTM F739 NT
NA
2-Ethoxyethanol (Cellosolve) 99% 110-80-5 27 1 ASTM F739 NT
NA
2-Ethoxyethyl acetate (Cellosolve Acetate) 99% 111-15-9 14 1 ASTM F739 4
+
2-Methoxyethanol (Methyl Cellosolve) 99% 109-86-4 40 2 ASTM F739 NT
NA
2-Methoxyethanol Acetate (Methyl cellosolve acetate) 98% 110-49-6 27 1 ASTM F739 NT
NA
2-Propanol (Isopropanol) 99% 67-63-0 38 2 ASTM F739 4
+
4,4 - diamino diphenylsulfone 97% 80-008-0 480 6 ASTM F739 NT
NA
4,4'-Methylenedianiline (MDA) 15% and 15% Methanol mixture 101-77-9 19 1 ASTM F739 NT
NA
4,4'-Methylenedianiline (MDA) 15% in Toluene mixture 101-77-9 15 1 ASTM F739 NT
NA
Acetic acid 10% 64-19-7 NT NT 4
NA
Acetic acid 50% 64-19-7 NT NT 4
NA
Acetic acid 99% 64-19-7 32 2 ASTM F739 4
+
Acetone 99% 67-64-1 6 0 ASTM F739 4
=
Aluminum Etch mixture NA 960 6 ASTM F739 4
++
Aluminum Oxide mixture NA 55 2 ASTM F739 NT
NA
Ammonium Fluoride 40% 12125-01-8 480 6 ASTM F739 NT
NA
Ammonium Fluoride 79% 12125-01-8 480 6 ASTM F739 NT
NA
Ammonium hydroxide solution 29% 1336-21-6 36 2 ASTM F739 4
+
Baker PRS-1000 mixture NA 20 1 ASTM F739 NT
NA
Baker PRS-2000 mixture NA 130 4 ASTM F739 NT
NA
Baker PRS-3000 mixture NA 480 6 ASTM F739 NT
NA
Benzene 99% 71-43-2 4 0 ASTM F739 1
-
Buffered Oxide Etch mixture NA 480 6 ASTM F739 4
++
Butyl Acetate 99% 123-86-4 7 0 ASTM F739 4
=
Chromic Acid 50% 7738-94-5 60 2 ASTM F739 NT
NA
Cyclohexanone 99% 108-94-1 23 1 ASTM F739 1
-
Cyclopentanone 99% 120-92-3 11 1 ASTM F739 NT
NA
Dichloromethane (Methylene Chloride) 99% 75-09-2 4 0 ASTM F739 NT
NA
Dichromate cleaning solution mixture NA 480 6 ASTM F739 4
++
Diethylamine 98% 109-89-7 4 0 ASTM F739 NT
NA
Diglycidal ether of bisphenol 100% 25068-38-6 480 6 ASTM F739 NT
NA
Dimethylamine 35% 124-40-3 53 2 ASTM F739 NT
NA
Dimethylformamide 99% 68-12-2 8 0 ASTM F739 NT
NA
Dimethylsulfoxide 99% 67-68-5 181 4 ASTM F739 4
++
Epichlorohydrin 99% 106-89-8 4 0 ASTM F739 NT
NA
Ethanol 95% 64-17-5 21 1 ASTM F739 NT
NA
Ethyl lactate 95% 97-64-3 29 1 ASTM F739 NT
NA
Ethylene glycol 99% 107-21-1 480 6 ASTM F739 4
++
Formaldehyde 37% 50-00-0 480 6 EN 16523-1:2015 4
++
Hexamethyldisilazane (HMDS) 98% 999-97-3 18 1 ASTM F739 1
-
Hydrochloric acid 10% 7647-01-0 480 6 EN 374-3:2003 4
++
Hydrochloric acid 35% 7647-01-0 NT NT 4
NA
Hydrochloric acid 37% 7647-01-0 454 5 ASTM F739 4
++
Hydrofluoric Acid 10% 7664-39-3 480 6 EN 374-3:2003 4
++
Hydrofluoric Acid 40% 7664-39-3 480 6 EN 16523-1:2015 NT
NA
Hydrofluoric Acid 49% 7664-39-3 390 5 ASTM F739 NT
NA
Hydrogen peroxide 30% 7722-84-1 960 6 ASTM F739 4
++
Hydrotreated Light Naphthenic Distillate mixture 64742-53-6 161 4 ASTM F739 2
+
Kerosene mixture 8008-20-6 26 1 ASTM F739 1
-
KOH Etch mixture NA 278 5 ASTM F739 4
++
KTI Pad Etch mixture NA 480 6 ASTM F739 NT
NA
KTI Silicon Etch mixture NA 480 6 ASTM F739 NT
NA
Methanesulfonic Acid 99% 75-75-2 NT NT 4
NA
Methanol 85% 67-56-1 19 1 ASTM F739 4
+
Methanol 99% 67-56-1 NT NT 4
NA
Methyl Amyl Ketone 98% 110-43-0 8 0 ASTM F739 1
-
Methyl Ethyl Ketone (2-Butanone) 99% 78-93-3 4 0 ASTM F739 3
=
Methyl-3-methoxypropionate 100% 3852-09-3 11 1 ASTM F739 3
=
n-hexane 95% 110-54-3 3 0 ASTM F739 1
-
N-methyl-2-Pyrrolidone 99% 872-50-4 50 2 ASTM F739 4
+
N-N dimethyl acetamide 99% 127-19-5 47 2 ASTM F739 NT
NA
Naphtha VM&P mixture 8032-32-4 2 0 ASTM F739 1
-
Nitric acid 10% 7697-37-2 840 6 ASTM F739 4
++
Nitric acid 20% 7697-37-2 480 6 ASTM F739 4
++
Nitric acid 40% 7697-37-2 480 6 ASTM F739 4
++
Nitric acid 50% 7697-37-2 NT NT 4
NA
Nitric acid 68% 7697-37-2 299 5 EN 374-3:2003 4
++
Nitric acid 70% 7697-37-2 307 5 ASTM F739 4
++
Nitric acid 90% 7697-37-2 7 0 ASTM F739 NT
NA
Nitride Etch mixture NA NT NT 4
NA
Nitrohydrochloric acid (Aqua Regia) mixture 8007-56-5 480 6 ASTM F739 NT
NA
Phenol 85% 108-95-2 102 3 ASTM F739 4
++
Phosphoric acid 75% 7664-38-2 480 6 ASTM F739 4
++
Phosphoric acid 85% 7664-38-2 480 6 ASTM F739 4
++
Phosphorus oxychloride 99% 10025-87-3 15 1 ASTM F739 NT
NA
Piranha Etch mixture NA 243 5 ASTM F739 1
-
Polyethylene glycol octylphenyl ether 100% 9002-93-1 480 6 ASTM F739 NT
NA
Potassium Hydroxide 50% 1310-58-3 480 6 ASTM F739 4
++
Potassium Hydroxide Etch mixture NA 24 1 ASTM F739 NT
NA
Propylene Glycol 99% 57-55-6 480 6 ASTM F739 4
++
Propylene Glycol Methyl Ethyl Acetate (PGMEA) 99% 108-65-6 47 2 ASTM F739 3
+
Propylene Glycol Monomethyl Ether 99% 107-98-2 26 1 ASTM F739 4
+
Silicon tetrachloride 100% 10026-04-7 15 1 ASTM F739 NT
NA
Slope Etch mixture NA 260 5 ASTM F739 4
++
Sodium hydroxide 20% 1310-73-2 780 6 ASTM F739 4
++
Sodium hydroxide 40% 1310-73-2 780 6 ASTM F739 4
++
Sodium hydroxide 50% 1310-73-2 780 6 ASTM F739 4
++
Sulfuric acid 10% 7664-93-9 900 6 ASTM F739 4
++
Sulfuric acid 96% 7664-93-9 102 3 ASTM F739 3
++
Tetrachloroethylene (Perchloroethylene) 99% 127-18-4 4 0 ASTM F739 1
-
Tetraethyl Orthosilicate 100% 78-10-4 25 1 ASTM F739 1
-
Tetramethyl Ammonium Hydroxide 25% 75-59-2 480 6 ASTM F739 4
++
Thionylchloride 99% 7719-09-7 15 1 ASTM F739 NT
NA
Toluene 49% Methyl Isobutyl Ketone 34.5% Methyl Ethyl Ketone 16.5% mixture NA 1 0 EN 374-3:2003 NT
NA
Toluene Diisocyanate (TDI) 80% 584-84-9 27 1 ASTM F739 NT
NA
Trichloroethylene 99% 79-01-6 NT NT 1
NA
Trimethylphosphite 97% 121-45-9 10 0 ASTM F739 NT
NA
Unleaded gasoline mixture 8006-61-9 4 0 ASTM F739 1
-
Xylene 99% 1330-20-7 4 0 ASTM F739 1
-

*not normalized result

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